Scanning electron microscope
The Hitachi SU-70 Schottky field emission SEM allows for high magnification and ultra-high resolution imaging at low and high accelerating voltages. Some special features include semi in-lens electron optics, and beam deceleration mode for imaging of fine surface structures on coated and uncoated samples at low landing energies and short working distances. A unique ‘Super ExB’ function allows for mixing and filtering of backscatter and secondary electron (from upper and lower SE detectors) signal ratios. This feature is useful for accentuating sample topography, providing information on sample composition and crystal orientation and eliminating charging artefacts associated with problem samples.
Specifications for Hitachi SU-70
1.0 nm at 15kV (4 mm WD, 220,000 x)
2.5 nm at 1 kV (1.5 mm WD, 100,000 x)
High mag mode – 100 x to 800,000 x
Low mag mode – 25 x to 2,000 x
- Electron Optics:
ZrO/W Schottky emission electron gun
0.5-30 kV accelerating voltage (plus deceleration mode)
Probe current 100 nA with 200 nA attainable
- Specimen Stage:
X and Y traverse – 0-110 mm
Z traverse (WD) – 1.5-40 mm
Tilt - -5° to + 70°
Rotation - 360°
Specimen size – Maximum 150 mm diameter
Energy dispersive spectrometry (EDS) and Electron backscatter diffraction (EBSD)
The integration of the Noran System 7 (NSS) X-Ray microanalysis system (Thermo Scientific) with the Hitachi field emission SEM allows for high sensitivity EDS and EBSD analyses. The EDS system features a liquid nitrogen cooled Si(Li) detector with high throughput digital pulse processing and sophisticated user-friendly software. It provides qualitative and quantitative information on elemental composition and distribution within a sample. A light element window allows for identification of elements down to Beryllium, with detection limits ranging from 0.1 to 1% (1000-10000 ppm), depending on sample composition and element of interest. Several acquisition modes are available. Point and Shoot combines electron imaging and X-Ray analysis to pinpoint areas of interest on your sample. Spectral Imaging mode or elemental mapping allows for the acquisition of data from large areas, which can be manipulated in a variety of ways following initial data collection. The NSS software is available to be installed on user’s personal computers, meaning projects can be easily accessed and subject to further analyses in your own time.
The NSS system combines EBSD and EDS capabilities within a single software interface. The Thermo Scientific QuasOr EBSD system determines the crystal structure of samples and allows for the crystallographic mapping of complex materials and minerals to characterise texture, grain boundaries and size as well as crystal orientation and misorientation. Applications include the study of metals, alloys, intermetallics, ceramics, geological minerals and semiconductors. EDS can also be used simultaneously during EBSD data collection to determine the chemistry of samples.
Hitachi E-1045 Ion Sputter Coater
Many types of samples will require coating prior to examination in the SEM or analysis with EDS or EBSD. Coating increase the electrical conductivity of insulating samples, reduces microscope beam damage and sample charging and improves the ‘return’ or emission of secondary electrons off samples that have low atomic number elemental matrices (e.g. biological samples).
The E-1045 ion sputter coater can produce high resolution, continuous films with precise thicknesses at controlled temperatures. Targets available are Gold (Au), Platinum (Pt) and Carbon (C).